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Strong laser doping machine in rotating disc for Solar photovoltaic

Model:SLAC-182210-SE

Application: In the photovoltaic industry, this machine is used to heavily dope the connecting part of the front metal grid line (electrode) of the silicon solar PERC cell and the silicon wafer. By the local heating of the laser, the middle phosphorous atoms (PSG) quickly diffuse into the silicon wafer for a second time, and then the connection part will form a local heavily doped area. With laser high-precision graphics, it will have a perfect overprint effect after combining with subsequent screen printing

Advantages

Independent operation on both sides;

Maximum capacity ≥ 7500UPH;

Battery size: 166mm×166mm~210mm×210mm;

Imported laser,532nm nanosecond green laser, stable and reliable;

Graphic accuracy ≤±15 um

Square spot size: 90-120um;

Adjustable rear resistance (after laser diffusion) : 40-90Ω (square resistance drop ≥50Ω)

High degree of automation, the machine can be matched with online/offline structure according to requirements. The loading and unloading mechanism can be connected to the AGV trolley. The internal empty flower basket can be transferred on the connecting platform to improve the AGV handling efficiency.

Precision visual positioning, automatic detection edge collapse function, high-speed flexible transmission mechanism, debris rate less than 0.03%;

Equip with independent dust removal and filtration device: dust removal efficiency is more than 95%, dust filtration efficiency is more than 99%;

Specification
No.ItemIndex
01Center wavelength532±0.5 nm
02Laser power40 W@100 kHz
03Repetition frequency1 Hz~500KHz
04Power stability<3.0% rms up to 300KHz
05The laser pulse width<25 ns
06Beam qualityM²≤1.2
07Spot roundness>90%
08Spot diameter1.0 mm
09Overall dimensions635*153*115m m3
10Frequency trigger modePSO, PODT and TGL touch AT to send E mode is optional
11Warm up time≤15 min
12Working humidityLess than 60%RH @5℃
13Working temperature20~30 ℃
14Cooling wayWater
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